Deadline: May 15, 2024
Applications are open for the Tällberg Leaders Mentoring Leaders Program 2025. The Tällberg Leaders Mentoring Leaders program is designed to equip emerging leaders with the skills, knowledge, and network needed to address today’s pressing global challenges. If you are an emerging leader with high demonstrated potential and who seeks to accelerate your leadership journey, don’t miss out on this transformative opportunity!
TLML aims to identify and nurture emerging leaders with outsized potential, leveraging the Tällberg Foundation’s global network to accelerate their growth as impactful leaders. The Tällberg Foundation has a deep commitment to encouraging global, values-based leadership wherever they can find it. In a world beset by existential challenges, they believe the only sustainable solutions are the ones imagined and pursued by leaders who operate with courage, creativity, persistence, commitment to universal values—but, above all, an understanding that global challenges demand global solutions.
The concept is simple: in our messy world, we need as many extraordinary leaders as possible. TLML matches emerging leaders from a wide range of countries and disciplines with equally diverse established leaders in a focused, year-long process of conversation and collaboration designed to accelerate the development of high-potential leaders.
Eligibility
- Anyone, anywhere from any country and from any discipline e.g. politicians, statesmen, scientists, educators, social entrepreneurs, CEOs, environmentalists, artists, religious and military figures, and others can apply.
- The working language for the TLML program is English.
Application
Applications are made in the form in five simple steps:
- Create your profile in the application portal;
- Describe the ways in which you meet the core criteria in your words and also include a short video;
- Share your career highlights with organisers;
- Add any relevant supporting materials;
- Save and submit your application.
For more information, visit TLML.
